Chemically machined spectral grating

Details Chemically machined spectral grating Chemically machined spectral grating

1981-06-01

1982-11-02

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156647, 156657, 1566591, 156662, 350162R, G02B 518

Patent

active

043572049

ABSTRACT:
A process for manufacturing spectral gratings having very low blaze angles by preferential etching of single crystal substrates with the resultant exposed crystal planes utilized as the grating.

REFERENCES:
patent: 3615955 (1971-10-01), Regh et al.
Tsang et al., "Preferentially Etch . . . Silicon", J. of Appl. Phys., vol. 46, No. 5 (5/75), pp. 2163-2165.
Bassous, "Fabrication . . . Silicon", IEEE Trans. on Electron Devices, vol. 25, No. 10 (10/78), pp. 1178-1185.
Lee, "Anisotropic . . . Silicon", J. of Appl. Phys., vol. 40, No. 11 (10/69), pp. 4569-4574.
Matsui et al., "Fabrication . . . Etching", Jap. J. of Appl. Phys., vol. 19, No. 3 (3/80), pp. 126-127.

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