Chemically-assisted ion beam milling system for the preparation

Details Chemically-assisted ion beam milling system for the preparation Chemically-assisted ion beam milling system for the preparation

1989-11-06

1991-04-23

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156654, 156662, 156345, 20419234, 20419235, 20429836, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

050097431

ABSTRACT:
An ion beam milling system for the preparation of transmission electron microscope specimens suitable for atomic resolution imaging, particularly of III-V and II-VI compound semiconductors and their alloys, is described. The system includes ion beam sources and reactive molecular gas jets which may be operated in combination or separately, as appropriate. A new heated specimen holder, giving greatly increased reaction rates with the molecular gas jet, allows milling angles very close to zero.

REFERENCES:
patent: 4734152 (1988-03-01), Geis et al.
patent: 4734158 (1988-03-01), Gillis
patent: 4874459 (1989-10-01), Coldren et al.
patent: 4874460 (1989-10-01), Nakagawa et al.

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