Chemically amplified resists

Details Chemically amplified resists Chemically amplified resists

1997-10-01

1999-11-09

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

526279, 526313, 430905, 430910, G03C 172

Patent

active

059811412

ABSTRACT:
In general, the invention provides polymers which may be used in chemically amplified resists. More particularly, the invention relates to esterified polymers containing the group: ##STR1## Resist compositions comprise the esterified polymers and photoacid generators.

REFERENCES:
patent: 4780516 (1988-10-01), Foley, Jr.
patent: 5883152 (1999-03-01), Anan et al.
Kotachi et al.; Si-Containing Positive Resists For ArF Excimer Laser Lithography; Journal o fPhotopolymer Science and Technology; vol. 8, No. 4 (1995); pp. 615-622.

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