Chemically amplified resist material and patterning method...

Details Chemically amplified resist material and patterning method... Chemically amplified resist material and patterning method...

2005-01-18

2005-01-18

Kelly, Cynthia H. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S914000, C430S916000, C430S919000, C430S920000, C430S921000, C430S327000, C430S330000, C430S913000

Reexamination Certificate

active

06844135

ABSTRACT:
A chemically amplified resist material comprising a base resin and a photo acid generator having sensitivity at the wavelength of patterning exposure; wherein, the chemically amplified resist material further comprising an activator that generates an acid or a radical by a treatment other than the patterning exposure. A patterning method using the same is also disclosed.

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Copy of European Search Report dated Oct. 20, 2003.

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