Chemically amplified resist compositions and process for the for

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4302701, 4302851, 4302881, 4302811, 4302871, G03F 7039

Patent

active

06013416&

ABSTRACT:
Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble, film-forming compound having a structural unit containing a protected alkali-soluble group in which unit a protective moiety of said protected alkali-soluble group is cleaved upon action of an acid generated from a photoacid generator used in combination with said compound, thereby releasing a protective moiety from the alkali-soluble group and converting said compound to an alkali-soluble one, and a photoacid generator capable of being decomposed upon exposure to a patterning radiation to thereby produce an acid capable of causing cleavage of said protective moiety. The resist composition is particularly suitable for excimer laser lithography using an alkaline developer, and the formed resist patterns can exhibit a high sensitivity and excellent dry etch resistance without swelling.

REFERENCES:
patent: 5468589 (1995-11-01), Urano et al.
125: 208217, Chemical Abstracts, ACS of Nozaki, J. Photopolym. Sci. Technol. (1996), 9 (3), 509-522.
Koyanagi et al, SPIE vol. 1672, Advances in Resist Technology and Processing IX (1992) pp. 125-140.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Chemically amplified resist compositions and process for the for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemically amplified resist compositions and process for the for, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemically amplified resist compositions and process for the for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1460939

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.