Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-06-27
2000-01-11
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302701, 4302851, 4302881, 4302811, 4302871, G03F 7039
Patent
active
06013416&
ABSTRACT:
Alkali-developable, chemically amplified resist composition which comprises an alkali-insoluble, film-forming compound having a structural unit containing a protected alkali-soluble group in which unit a protective moiety of said protected alkali-soluble group is cleaved upon action of an acid generated from a photoacid generator used in combination with said compound, thereby releasing a protective moiety from the alkali-soluble group and converting said compound to an alkali-soluble one, and a photoacid generator capable of being decomposed upon exposure to a patterning radiation to thereby produce an acid capable of causing cleavage of said protective moiety. The resist composition is particularly suitable for excimer laser lithography using an alkaline developer, and the formed resist patterns can exhibit a high sensitivity and excellent dry etch resistance without swelling.
REFERENCES:
patent: 5468589 (1995-11-01), Urano et al.
125: 208217, Chemical Abstracts, ACS of Nozaki, J. Photopolym. Sci. Technol. (1996), 9 (3), 509-522.
Koyanagi et al, SPIE vol. 1672, Advances in Resist Technology and Processing IX (1992) pp. 125-140.
Igarashi Miwa
Kotachi Akiko
Kuramitsu Yoko
Namiki Takahisa
Nozaki Koji
Fujitsu Limited
Hamilton Cynthia
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