Chemically amplified resist compositions and patterning process

Details Chemically amplified resist compositions and patterning process Chemically amplified resist compositions and patterning process

2005-02-15

2005-02-15

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000

Reexamination Certificate

active

06855477

ABSTRACT:
A chemically amplified resist composition comprising (A) a polymer comprising recurring units containing at least one fluorine atom, (B) a compound of formula (1) wherein R1and R2are H, F or alkyl or fluorinated alkyl, at least one of R1and R2contains at least one fluorine atom, R3is a single bond or alkylene, R4is a n-valent aromatic or cyclic diene group, R5is H or C(═O)R6, R6is H or methyl, and n is 2, 3 or 4, (C) an organic solvent, and (D) a photoacid generator is sensitive to high-energy radiation and has improved sensitivity and transparency at a wavelength of less than 200 nm.

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Hamad, A.H. et al., Fluorinated dissolution inhibitors for 157 nm lithography, Mar. 2002, SPIE, vol. 4690, 477-485.

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