Chemically-amplified resist compositions

Details Chemically-amplified resist compositions Chemically-amplified resist compositions

2005-04-12

2005-04-12

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S909000, C430S910000

Reexamination Certificate

active

06878504

ABSTRACT:
A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below:wherein R1is H, C1-C4alkyl, or CF3; Q is C4-C12cycloalkyl; R2is H, C1-C4alkyl, or CF3; R3is C4-C12branched or cyclic alkyl; and x+y+z equals to 1. The chemically-amplified resist compositions of the present invention not only can be applied maturely to general lithographic processes, especially to 193 nm lithographic process, but also have excellent photo-sensitivity, and can form a well-resolved pattern and profile.

REFERENCES:
patent: 6303266 (2001-10-01), Okino et al.
patent: 6348297 (2002-02-01), Uetani et al.
patent: 6391520 (2002-05-01), Nakano et al.
patent: 6461788 (2002-10-01), Miwa et al.
patent: 6517993 (2003-02-01), Nakamura et al.
patent: 6586157 (2003-07-01), Hasegawa et al.
patent: 6673513 (2004-01-01), Choi et al.
patent: 6713228 (2004-03-01), Kim et al.

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