Chemically amplified resist composition and process for forming

Details Chemically amplified resist composition and process for forming Chemically amplified resist composition and process for forming

1994-11-03

1996-04-09

Mullis, Jeffrey

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, 430326, 430942, G03C 173

Patent

active

055060889

ABSTRACT:
Improved chemically amplified resist is provided that comprises 100 parts by weight of a copolymer produced from a first monomer unit having a recurrent acid labile pendant group that changes the polarity of the polymer and a second monomer unit having an alkali-soluble group and 1 to 20 parts by weight of a photo acid generator.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5073474 (1991-12-01), Schwalm et al.
patent: 5213919 (1993-05-01), Kuwakubo et al.
patent: 5350660 (1994-09-01), Urano et al.

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