Chemically amplified resist composition and method for...

Details Chemically amplified resist composition and method for... Chemically amplified resist composition and method for...

2005-06-07

2005-06-07

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S296000, C430S326000, C430S330000

Reexamination Certificate

active

06902859

ABSTRACT:
A chemically amplified resist composition which comprises a base resin reacting in the presence of an acid, a photo acid generator generating an acid upon exposure, and a compound having the combination of an acetal moiety and a site which is eliminated by an acid in its molecule, or which comprises a base resin, which is a copolymer having the combination of an acetal moiety and a site eliminated by an acid in one repeating unit and reacts in the presence of an acid, and a photo acid generator generating an acid upon exposure.

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patent: 6537726 (2003-03-01), Nakanishi et al.
patent: 2003/0096189 (2003-05-01), Yagihashi et al.
patent: 06-051518 (1994-02-01), None

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