Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-07-08
2008-07-08
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S914000, C430S921000, C430S919000, C430S325000, C430S326000
Reexamination Certificate
active
10873475
ABSTRACT:
With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposure and the development are carried out. The present invention relates to a chemically amplified resist composition comprising, at least, a photo acid generator, a quencher and a salt having a buffering function for an acid which is generated from the acid generator by irradiation, wherein the salt having the buffering function for the acid generated from the acid generator is a salt derived from a long chain alkylbenzenesulfonic acid or a long chain alkoxybenzenesulfonic acid and an organic amine that is a basic compound.
REFERENCES:
patent: 5650261 (1997-07-01), Winkle
patent: 2005/0032373 (2005-02-01), Cameron et al.
patent: 2005/0100814 (2005-05-01), Berger et al.
patent: 2001-100400 (2001-04-01), None
patent: WO01/04706 (2001-01-01), None
Maeda Kazunori
Nagahara Seiji
Watanabe Satoshi
Lee Sin J.
NEC Electronics Corporation
Shin-Etsu Chemical Co. , Ltd.
Young & Thompson
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