Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2009-03-02
2011-11-22
Chu, John (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S330000, C430S905000, C430S910000, C430S921000
Reexamination Certificate
active
08062829
ABSTRACT:
A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II).wherein X1represents a hydrogen atom, a C1to C4alkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, R1to R4independently represent a hydrogen atom, an alkyl group, etc., and A+represents an organic counterion, E−represents CF3SO3—, C2F5SO3—, C4F9SO3—, etc., Y1and Y2independently represent a fluorine atom or a C1to C6perfluoroalkyl group.
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Fuji Yusuke
Hata Mitsuhiro
Miyagawa Takayuki
Birch & Stewart Kolasch & Birch, LLP
Chu John
Sumitomo Chemical Company Limited
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