Chemically amplified resist composition

Details Chemically amplified resist composition Chemically amplified resist composition

2008-03-20

2009-08-11

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S910000, C430S921000, C430S922000

Reexamination Certificate

active

07572570

ABSTRACT:
The present invention provides a chemically amplified resist composition comprising:(A) a resin which comprises (a) a structural unit having an acid-labile group, (b) a structural unit having at least one hydroxyl group, (c) a structural unit having at least one lactone structure, and (d) a structural unit represented by the formula (Ia) or (Ib):wherein R1represents a hydrogen atom or a methyl group, R3represents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or —[CH2]k—COO—, and(B) at least one acid generator.

REFERENCES:
patent: 6824957 (2004-11-01), Okino et al.
patent: 7029823 (2006-04-01), Okino et al.
patent: 7423102 (2008-09-01), Lee et al.
patent: 2001/0016298 (2001-08-01), Nakanishi et al.
patent: 2003-5374 (2003-01-01), None

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