Chemically amplified positive resist compositions

Details Chemically amplified positive resist compositions Chemically amplified positive resist compositions

1996-04-03

1998-03-24

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430170, 528 10, 528 43, G03F 7039

Patent

active

057311269

ABSTRACT:
A chemically amplified positive resist composition comprising a specific polysiloxane having a terminal silanol group protected with a trimethylsilyl group, a photoacid generator and optionally a dissolution inhibitor is provided.

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patent: 5338818 (1994-08-01), Brunsvold et al.
patent: 5547808 (1996-08-01), Watanabe et al.

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