Chemically amplified positive resist compositions

Details Chemically amplified positive resist compositions Chemically amplified positive resist compositions

1997-04-01

1999-11-16

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, G03G 7004

Patent

active

059855126

ABSTRACT:
A chemically amplified positive resist composition is prepared by blending (A) an organic solvent, (B) a base resin, and (C) a photoacid generator with a mixture of (1) a nitrogenous organic compound having pKa.gtoreq.7 and a vapor pressure of less than 2 Torr at 100.degree. C. and (2) a nitrogenous organic compound having pKa.gtoreq.7 and a vapor pressure of 2-100 Torr at 100.degree. C. The resist composition has high sensitivity to actinic radiation and high resolution, is developable with aqueous base to form a pattern without a T-top profile by PED and footing on the substrate surface, and is suitable for fine processing.

REFERENCES:
patent: 5556734 (1996-09-01), Yamachika et al.
patent: 5580695 (1996-12-01), Murata et al.
patent: 5658706 (1997-08-01), Nlki et al.
patent: 5693452 (1997-12-01), Aoai et al.
patent: 5707776 (1998-01-01), Kawabe et al.
patent: 5736296 (1998-04-01), Sato et al.
patent: 5750309 (1998-05-01), Hatakeyama et al.
English abstract of JP-A 265213/93.

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