Chemically amplified positive resist composition and...

Details Chemically amplified positive resist composition and... Chemically amplified positive resist composition and...

2007-10-30

2007-10-30

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S905000, C430S907000, C430S910000, C430S922000

Reexamination Certificate

active

11105457

ABSTRACT:
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and good storage stability.

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