Chemically amplified positive resist composition, a...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S905000, C430S910000

Reexamination Certificate

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11123104

ABSTRACT:
The present invention provides a chemically amplified positive resist composition comprising(A) a resin which comprises(i) at least one structural unit selected from the group consisting of structural units of the formulas (no and (V), (ii) a structural unit of the formula (I) and (iii) a structural unit of the formula (II), and(B) an acid generator.The present invention also provides a haloester derivative of the formula (XXI) and a process for producing the same

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patent: 11-218924 (1999-08-01), None
patent: 2001-188346 (2001-07-01), None
patent: 2003-147019 (2003-05-01), None
patent: 2004-210917 (2004-07-01), None

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