Chemically amplified positive resist composition

Details Chemically amplified positive resist composition Chemically amplified positive resist composition

2011-07-05

2011-07-05

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000

Reexamination Certificate

active

07972763

ABSTRACT:
The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.

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