Chemically amplified positive resist composition

Details Chemically amplified positive resist composition Chemically amplified positive resist composition

1995-10-06

1997-05-13

Letscher, Geraldine

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302811, 430326, 430905, G03C 1492, G03C 1494, G03C 176

Patent

active

056291345

ABSTRACT:
In a chemically amplified positive resist composition comprising an organic solvent, an alkali soluble resin, an acid generator, and an optional dissolution inhibitor, a salt of a pyridine which may have an alkyl, alkoxy, amino or dialkylamino group with an alkylsulfonic acid, arylsulfonic acid or halogen atom is blended. Because of high sensitivity to deep UV and resolution and elimination of the PED problem causing T-top pattern configuration and the skirting phenomenon, the resist composition is improved in dimensional precision and lends itself to fine patterning.

REFERENCES:
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patent: 5091285 (1992-02-01), Watanabe et al.
patent: 5100768 (1992-03-01), Niki et al.
patent: 5272036 (1993-12-01), Tani et al.
patent: 5310619 (1994-05-01), Crivello et al.
patent: 5364738 (1994-11-01), Kondo et al.

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