Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-04-01
1999-03-16
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302861, 4302871, 4302701, 522 31, 522 25, 522 91, 522142, 522148, G03F 7029, G03F 7032
Patent
active
058828443
ABSTRACT:
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polysiloxane having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight average molecular weight of 2,000-50,000, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition has high sensitivity to actinic radiation, is developable with aqueous base to form a resist pattern, and lends itself to fine patterning.
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English abstract of JP-A 265213/93.
Ishihara Toshinobu
Nagura Shigehiro
Takemura Katsuya
Tsuchiya Junji
Yamaoka Tsuguo
Hamilton Cynthia
Shin-Etsu Chemical Co. , Ltd.
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