Chemically amplified positive resist composition

Details Chemically amplified positive resist composition Chemically amplified positive resist composition

1995-06-06

1997-04-29

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430914, 430921, 522 15, 522 31, G03F 7039

Patent

active

056247877

ABSTRACT:
A chemically amplified, positive resist composition contains a trifluoromethanesulfonic or p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salt and a nitrogenous compound. The composition is highly sensitive to high energy radiation, especially KrF excimer laser and has high sensitivity, resolution and plasma etching resistance while the resulting resist pattern is heat resistant.

REFERENCES:
patent: 4108747 (1978-08-01), Crivello
patent: 4603101 (1986-07-01), Crivello
patent: 5220037 (1993-06-01), Schwalm et al.
patent: 5346803 (1994-09-01), Crivello
Kawai et al, from Compendex Database, Abstract in reference to Proceedings of 7th International MicroProcess Conference (MPC'94), in Hsin Shu, Taiwan, Jul. 11, 1994 thro Jul. 14, 1994 and Japanese Journal of Applied Physics, Part 1: vol. 33, n 12 B Dec. 1994, pp. 7023-7027.
Reichmanis et al (eds), Polymers in Lithograpy, Chapter 5, American Chemical Society, 1989, pp. 74-85.

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