Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2009-04-17
2011-11-15
Chu, John (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S907000, C430S910000
Reexamination Certificate
active
08057983
ABSTRACT:
The present invention provides a chemically amplified resist composition comprising:a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain,a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, andan acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
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Ando Nobuo
Fuji Yusuke
Miyagawa Takayuki
Shigematsu Junji
Takemoto Ichiki
Birch & Stewart Kolasch & Birch, LLP
Chu John
Sumitomo Chemical Company Limited
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