Chemically amplified positive resist composition

Details Chemically amplified positive resist composition Chemically amplified positive resist composition

2006-11-07

2006-11-07

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000

Reexamination Certificate

active

07132218

ABSTRACT:
The present invention provide a chemically amplified positive resist composition comprisinga resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid;an acid generator; anda compound of the formula (C-1)wherein R1and R2each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R3, R4and R5each independently represents a hydrogen or a hydroxyl.

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patent: 2004/0146802 (2004-07-01), Yamamoto et al.
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