Chemically amplified positive resist composition

Details Chemically amplified positive resist composition Chemically amplified positive resist composition

2011-08-16

2011-08-16

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000, C430S910000

Reexamination Certificate

active

07998656

ABSTRACT:
The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I):wherein R1represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3and X4each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.

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