Chemically amplified positive resist composition

Details Chemically amplified positive resist composition Chemically amplified positive resist composition

1997-04-01

1999-03-02

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302701, 430905, G03F 7029, G03F 7033

Patent

active

058769005

ABSTRACT:
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight-average molecular weight of 3,000-300,000 and a dispersity of 1.0 to 1.5, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition is sensitive to actinic radiation, especially KrF excimer laser beam, has high sensitivity and resolution, and forms a resist pattern having improved plasma etching resistance and heat resistance.

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patent: 5468589 (1995-11-01), Urano et al.
patent: 5558971 (1996-09-01), Urano et al.
patent: 5677112 (1997-10-01), Urano et al.
patent: 5695910 (1997-12-01), Urano et al.
English abstract of JP-A 265213/93.

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