Chemically amplified positive photoresists

Details Chemically amplified positive photoresists Chemically amplified positive photoresists

1995-12-05

1999-03-09

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430171, 430910, 430326, G03F 716, G03F 7039

Patent

active

058798560

ABSTRACT:
Photoresist compositions are provided comprising 1) a resin binder having photoacid-labile groups, 2) an acid generator and 3) a photospeed control agent. Photoresists of the invention exhibit good photospeed and can provide highly resolved relief images of small dimensions, including lines of sub-micron and sub-half micron dimensions with at least essentially vertical side walls. Methods are also provided that include control of photospeed of a photoresist composition of the invention.

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Patent Abstracts of Japan, vol. 18, No. 273 (P-1742), 24 May 1994 & JP 06 043653 A (Nippon Telegr. & Teleph. Corp.).

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