Chemically amplified positive photoresist composition for...

Details Chemically amplified positive photoresist composition for... Chemically amplified positive photoresist composition for...

2007-01-30

2007-01-30

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C428S336000, C428S339000, C430S905000

Reexamination Certificate

active

11025589

ABSTRACT:
A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that displays increased alkali solubility under the action of acid, and (C) an alkali-soluble resin, wherein the component (B) comprises a resin formed from a copolymer containing a structural unit (b1) with a specific structure.

REFERENCES:
patent: 6365321 (2002-04-01), Chen et al.
patent: 6830867 (2004-12-01), Kodama
patent: 2003/0064319 (2003-04-01), Saito et al.
patent: 2001-281862 (2001-10-01), None
patent: 2001-281863 (2001-10-01), None
patent: 2002-258479 (2002-09-01), None
patent: 2004-309775 (2004-11-01), None
patent: 2004-309776 (2004-11-01), None
patent: 2004-309777 (2004-11-01), None
patent: 2004-309778 (2004-11-01), None
U.S. Appl. No. 11/025,591, filed Dec. 29, 2004, Tokyo Ohka Kogyo Co., Ltd.
U.S. Appl. No. 11/025,833, filed Dec. 29, 2004, Tokyo Ohka Kogyo Co., Ltd.
U.S. Appl. No. 11/025,870, filed Dec. 29, 2004, Tokyo Ohka Kogyo Co., Ltd.

Affiliated with

Also associated with

Rating

Chemically amplified positive photoresist composition for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemically amplified positive photoresist composition for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemically amplified positive photoresist composition for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3788956