Chemically amplified positive photoresist composition for...

Details Chemically amplified positive photoresist composition for... Chemically amplified positive photoresist composition for...

2011-05-31

2011-05-31

Kelly, Cynthia H (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S287100, C430S288100

Reexamination Certificate

active

07951522

ABSTRACT:
A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that displays increased alkali solubility under the action of acid, and (C) an alkali-soluble resin, wherein the component (B) comprises a resin formed from a copolymer containing a structural unit (b1) with a specific structure.

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