Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-04-15
2008-04-15
Lee, Sin (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S330000, C430S905000, C430S919000, C430S921000
Reexamination Certificate
active
07358028
ABSTRACT:
The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that solubility in an aqueous alkali solution is enhanced in the presence of an acid, which is then dissolved in an organic solvent, together with (B) a compound generating an acid under irradiation with radiation to obtain a chemical amplification type positive photoresist composition wherein the content of an acid component is 10 ppm or less.
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Office Action dated Jan. 10, 2007 in connection with Korean Patent Application No. 10-2006-7021725.
Doi Kousuke
Kurihara Masaki
Maruyama Kenji
Masujima Masahiro
Miyagi Ken
Knobbe Martens Olson & Bear LLP
Lee Sin
Tokyo Ohka Kogyo Co. Ltd.
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