Chemically amplified polymer having pendant group with...

Details Chemically amplified polymer having pendant group with... Chemically amplified polymer having pendant group with...

2002-11-19

2008-03-18

Chu, John S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C526S269000, C526S281000, C526S308000, C560S118000, C560S128000

Reexamination Certificate

active

07344820

ABSTRACT:
The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.

REFERENCES:
patent: 5968713 (1999-10-01), Nozaki et al.
patent: 6420082 (2002-07-01), Sato et al.
patent: 6576392 (2003-06-01), Sato et al.
patent: 1996-101509 (1996-04-01), None
patent: 2001-40033 (2001-05-01), None
patent: 2001-85567 (2001-09-01), None
patent: 2002-47866 (2002-06-01), None

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