Chemically amplified negative photoresist, and photoresist...

Details Chemically amplified negative photoresist, and photoresist... Chemically amplified negative photoresist, and photoresist...

2005-03-29

2005-03-29

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C526S266000, C526S270000, C549S369000, C549S357000

Reexamination Certificate

active

06872502

ABSTRACT:
A polymer for a chemically amplified negative photoresist and a photoresist composition are provided. A representative polymer of the invention is a compound of formula 5:wherein: R1through R5and R14through R17are defined as set fourth in the specification, and a, b, c, and d represent the mole ratios of each monomer, wherein a has a value of 0-0.5, b has a value of 0-0.9, c has a value of 0-0.3, and d has a value of 0-0.3, provided that a+b+c+d=1; and n represents the degree of polymerization of each polymer, and has a value of at least 2.

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