Chemicallly amplified resist composition

Details Chemicallly amplified resist composition Chemicallly amplified resist composition

2007-12-03

2010-06-22

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C430S921000, C430S922000

Reexamination Certificate

active

07741007

ABSTRACT:
The present invention provides a chemically amplified resist composition comprising:(A) a salt represented by the formula (1)wherein R21, Q1, Q2, and A+defined in the specification;(B) a salt represented by the formula (II):wherein R22, Q3, Q4, and A′+are defined in the specification; and(C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

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