Chemical vapor deposition system

Valves and valve actuation – Pivoted valves

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118715, 118719, 414217, F16K 116

Patent

active

048282243

ABSTRACT:
This invention discloses a system for chemically depositing various materials carried by a reactant gas onto substrates for manufacturing semiconductor devices. The system includes special loading and unloading sub-system for placement of substrates to be processed into the system and subsequent extraction without contamination of the system. A special substrate handling sub-system is provided for moving the substrates to and from at least one processing sub-system without physically contacting the planar surfaces of the substrates. The processing sub-system includes a horizontal gas flow reaction chamber having a rotatable susceptor therein for rotating the single substrate supportable thereon about an axis that is normal to the center of the substrate for averaging of the temperature and reactant gas concentration variables. The processing sub-system is separated from the handling sub-system by a special isolation valve and a gas injection device is used to inject the gas into the reaction chamber with a predetermined velocity profile. A special temperature sensing arrangement is provided in the processing sub-system for controlling a radiant heating sub-system which is provided above and below the reaction chamber.

REFERENCES:
patent: 3857545 (1974-12-01), Santi
patent: 4503807 (1985-03-01), Nakayama
patent: 4505452 (1985-03-01), Bragin
patent: 4584045 (1986-04-01), Richards
patent: 4670126 (1987-06-01), Messer
patent: 4715764 (1987-12-01), Hutchinson

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Chemical vapor deposition system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapor deposition system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-84003

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.