Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...
Patent
1992-06-18
1993-11-02
Owens, Terry J.
Coating processes
Coating by vapor, gas, or smoke
Base includes an inorganic compound containing silicon or...
427108, 427109, 4271263, 4272481, C23C 1600, B05D 512
Patent
active
052582043
ABSTRACT:
Thin, uniform films of complex metal oxides are deposited by chemical vapor deposition onto a substrate by vaporizing a single source precursor, which is the reaction product of a metal M' beta-diketonate and a metal M" alkoxide, where metal M' is Li, Na, K, Ba, Mg, Ca, Sr, or Pb, and metal M" is V, Nb, Ta, or Ti, and contacting the vapor with the substrate at a temperature sufficiently high to decompose the precursor and form an M'M" metal oxide. Alternatively, compounds in which a M" metal is attached to a beta-diketonate, and an M' metal is attached to an alkoxide, are used to form the reaction product vapor precursor.
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Methrotra et al., "Alkali-metal Hexa-alkoxides of Niobium and of Tantalum", J. Chem. Soc., 1968, pp. 2673-2676.
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Gysling Henry J.
Wernberg Alex A.
Eastman Kodak Company
Maiorana David M.
Owens Terry J.
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