Chemical vapor deposition of high conductivity, adherent...

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

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C427S250000, C427S255280, C427S255310

Reexamination Certificate

active

08034407

ABSTRACT:
A multi-step method for depositing ruthenium thin films having high conductivity and superior adherence to the substrate is described. The method includes the deposition of a ruthenium nucleation layer followed by the deposition of a highly conductive ruthenium upper layer. Both layers are deposited using chemical vapor deposition (CVD) employing low deposition rates.

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