Stock material or miscellaneous articles – Composite – Of polyisocyanurate
Patent
1999-03-29
2000-12-05
Jones, Deborah
Stock material or miscellaneous articles
Composite
Of polyisocyanurate
428421, 428375, 428378, 428 641, 3034653, 3034654, 606 1, 623 24, 128731, B32B 2700
Patent
active
061564354
ABSTRACT:
Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas. The monomer gas employed in the methods preferably includes hexafluoropropylene oxide. The monomer gas pyrolysis and plasma excitation methods can be carried out individually, sequentially, or simultaneously. Flexible fluorocarbon polymer thin films can thusly be produced on wires, twisted wires, neural probes, tubing, complex microstructures, substrates, microfabricated circuits, and other structures. The thin films have a compositional CF.sub.2 fraction of at least about 50%, a dielectric constant of less than about 1.95, and a crosslinking density of less than about 35%.
REFERENCES:
patent: 4536179 (1985-08-01), Anderson et al.
patent: 4921723 (1990-05-01), Nichols et al.
patent: 5153986 (1992-10-01), Brauer et al.
patent: 5244730 (1993-09-01), Nguyen et al.
patent: 5302420 (1994-04-01), Nguyen et al.
patent: 5380557 (1995-01-01), Spiro
Panchalingam et al., "Molecular surface tailoring of biomaterials via pulsed RF plasma discharges," J. Biomater. Sci. Polymer Edn., vol. 5, No. 1/2, pp. 131-145, 1993.
Morosoff et al., "Free Radicals Resulting from Plasma Polymerization and Plasma Treatment," J. Macromol. Sci.-Chem., vol. A10, No. 3, pp. 451-471, 1976. No Month.
H. Yasuda, "Plasma for Modification of Polymers," J. Macromol. Sci.-Chem., vol. A10, No. 3, pp. 383-420, 1976. No Month.
Yasuda et al., "Some Aspects of Plasma Polymerization Investigated by Pulsed R.F. Discharge," Jnl of Polymer Science: Polymer Chemistry Edition, vol. 15, pp. 81-97, 1977. No Month.
Hsu et al., "Kinetics and Mech. of Reactions of CF, CHF, & CF.sub.2 Radicals," in Fluorine-Containing Free Radicals, Ch. 5, pp. 128-151; John Root, Ed., ACS Symp. Series, No. 66, 1978. No Month.
Kay et al. "Plasma Chemistry of Fluorocarbons as Related to Plasma Etching and Plasma Polymerization," Topics in Current Chemistry-Plasma Chemistry III, pp. 25-35, Veprek et al. Eds., NY, NY, 1980. No Month.
Dilks et al, "Plasma Polymerization of Ethylene and the Series of Fluorethylenes: Plasma Effluent Mass Spectrometry and ESCA Studies," Macromolecules, vol. 14, pp. 855-862, 1981. No Month.
Clark et al., "Plasma Polymerization. VI. An ESCA Investigation of the RF Plasma Polymerization of Perfluoro-2-Butyl Tetrahydrofuran," Jnl. of Polymer Sci: Polymer Chemistry Edition, vol. 20, pp. 691-706, 1982. No Month.
H. Yasuda, Plasma Polymerization, Chapter 6, pp. 73-177 and Chapter 11, pp. 370-389, Academic Press, Inc., New York, New York, 1985. No Month.
d'Agostino et al., "Polymer Film Formation in C.sub.2 F.sub.6 -H.sub.2 Discharges," Thin Solid Films, vol. 143, pp. 163-175, 1986. No Month.
Ratner et al., "Plasma Deposition and Treatment for Biomedical Applications," Plasma Depos., Treatment, & Etching of Polymers, d'Agostino, Ed., Ch. 7, Academic Press, NY, NY 1990. No Month.
d'Agostino et al., "Plasma Polymerization of Fluorocarbons," Plasma Deposition, Treatment, and Etching of Polymers, d'Agostino, Editor, Ch. 2, Academic Press, NY 1990. No Month.
Butler et al., "Properties of micrometer-thick plasma-polymerized tetrafluoroethylene films," J. Appl. Phys., vol. 70, No. 4, pp. 2326-2332, Aug. 15, 1991. No Month.
Nason et al., "Deposition of amorphous fluoropolymer thin films by thermolysis of Teflon amorphous fluoropolymer," Appl. Phys. Lett., vol. 60, No. 15, pp. 1866-1868, Apr. 13, 1992. No Month.
Savage et al., "Spectropscopic Characterization of Films Obtained in Pulsed Radio-Frequency Plasma Discharges of Fluorocarbon Monomers," Structure-Property Relations in Polymers, Advances in Chemistry Series, vol. 236, pp. 745-768, 1993. No Month.
Abstracts of Japan, No. 93-138379, week 9317, JP5074960, Fujitsu Ltd., Mar. 26, 1993. No Month.
Panchalingam et al., "Molecular surface tailoring of biomaterials via pulsed RF plasma discharges," J. Biomater. Sci. Polymer Edn., vol. 5, No. 1/2, pp. 131-145, 1993. No Month.
Blanchet et al., "Laser Ablation and the Production of Polymer Films," Science, vol. 262, pp. 719-721, Oct. 29, 1993. No Month.
M. F. Nichols, "Flexible and insulative Plasmalene wire coatings for biomedical applications," ISA Paper #93-011, pp. 77-86, 1993. No Month.
Jansen et al., "Applications of fluorocarbon polymers in micromechanics and micromachining," Sensors and Actuators A, vol. 41-42, pp. 136-140, 1994. No Month.
Endo et al., "Fluorinated amorphous carbon thin films grown by plasma enhanced CVD for low dielectric const. interlayer dielectrics," J. Appl. Phys., V. 78, N. 2, pp. 1370-1372, Jul. 15, 1995.
Panchalingam et al., "Pulsed RF plasma polymerization of Perfluoro-2-Butyl-Tetrahydrofuran," Polymeric Materials: Science and Engineering Proceedings of the ACS Division of Polymeric Materials, Science, and Eng., vol. 67, pp. 256-257, 1992. No Month.
Limb et al., "Growth of fluorocarbon polymer thin films with high CF.sub.2 fractions and low dangling bond concentrations by thermal chemical vapor deposition," Appl. Phys. Lett., vol. 68, No. 20, pp. 2810-2812, May 13,1996.
Edell David J.
Gleason Edward F.
Gleason Karen K.
Limb Scott J. H.
Sawin Herbert H.
Boss Wendy
Jones Deborah
Lober Theresa A.
Massachusetts Institute of Technology
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