Chemical vapor deposition of chalcogenide materials via...

Details Chemical vapor deposition of chalcogenide materials via... Chemical vapor deposition of chalcogenide materials via...

2008-09-22

2010-12-28

Turocy, David (Department: 1715)

Coating processes

With post-treatment of coating or coating material

C427S255280, C427S248100, C427S255310, C427S255290, C427S532000, C427S402000

Reexamination Certificate

active

07858152

ABSTRACT:
A chemical vapor deposition (CVD) process for preparing electrical and optical chalcogenide materials. In a preferred embodiment, the instant CVD-deposited materials exhibit one or more of the following properties: electrical switching, accumulation, setting, reversible multistate behavior, resetting, cognitive functionality, and reversible amorphous-crystalline transformations. In one embodiment, a multilayer structure, including at least one layer containing a chalcogen element, is deposited by CVD and subjected to post-deposition application of energy to produce a chalcogenide material having properties in accordance with the instant invention. In another embodiment, a single layer chalcogenide material having properties in accordance with the instant invention is formed from a CVD deposition process including three or more deposition precursors, at least one of which is a chalcogen element precursor. Preferred materials are those that include the chalcogen Te along with Ge and/or Sb.

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