Chemical vapor deposition of a copolymer of p-xylylene and a mul

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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4272556, 438780, C23C 1600

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active

060869526

ABSTRACT:
A method for forming thin polymer layers having low dielectric constants or semiconductor substrates. In one embodiment, the method includes the vaporization of stable di-p-xylylene, the pyrolytic conversion of such gaseous dimer material into reactive monomers, and blending of the resulting gaseous p-xylylene monomers with one or more comonomers having silicon-oxygen bonds and at least two pendent carbon--carbon double bonds. The copolymer films have low dielectric constants, improved thermal stability, and excellent adhesion to silicon oxide layers in comparison to parylene-N homopolymers.

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