Chemical vapor deposition method for forming thin film

Details Chemical vapor deposition method for forming thin film Chemical vapor deposition method for forming thin film

1990-08-17

1993-07-06

Pianalto, Bernard

Coating processes

Coating by vapor, gas, or smoke

427249, 427314, C23C 1600

Patent

active

052252450

ABSTRACT:
An apparatus for forming, by a chemical vapor deposition process, a thin film of crystals such as diamond on a surface of a heated substrate placed in a reaction vessel. The apparatus has a substrate supporting structure, a heater for heating the substrate by heat conduction or by electric current supplied directly to the substrate, and a cooling device for cooling the substrate. The heater is controlled in accordance with the measured temperature of the substrate so as to accurately maintain the substrate temperature at a constant level.

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