Chemical vapor deposition apparatus for forming thin film

Coating apparatus – Control means responsive to a randomly occurring sensed... – Temperature responsive

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118708, 118723, 118724, 118725, C23C 1650

Patent

active

052091821

ABSTRACT:
An apparatus for forming, by a chemical vapor deposition process, a thin film of crystals such as diamond on a surface of a heated substrate placed in a reaction vessel. The apparatus has a substrate supporting structure, a heater for heating the substrate by heat conduction or by electric current supplied directly to the substrate, and a cooling device for cooling the substrate. The heater is controlled in accordance with the measured temperature of the substrate so as to accurately maintain the substrate temperature at a constant level.

REFERENCES:
patent: 5099788 (1992-03-01), Ito

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