Chemical vapor deposition apparatus and methods

Details Chemical vapor deposition apparatus and methods Chemical vapor deposition apparatus and methods

2008-04-08

2008-04-08

Meeks, Timothy (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S248100, C427S249100, C427S249500

Reexamination Certificate

active

07354631

ABSTRACT:
This invention includes chemical vapor deposition apparatus, methods of chemical vapor depositing an amorphous carbon comprising layer on a substrate, and methods of chemical vapor depositing at least one of Si3N4and SixOyNzon a substrate. In certain implementations, a gas output manifold having at least one gas output to a deposition chamber and at least three gas inputs is utilized. In certain implementations, a remote plasma generator is utilized. In certain implementations, at least one cleaning gas input line feeds the remote plasma generator. In certain implementations, the at least one cleaning gas input line includes an amorphous carbon cleaning gas input and an Si3N4or SixOyNzcleaning gas input.

REFERENCES:
patent: 4382100 (1983-05-01), Holland
patent: 4436797 (1984-03-01), Brady et al.
patent: 4510176 (1985-04-01), Cuthbert et al.
patent: 4675265 (1987-06-01), Kazama et al.
patent: 4732785 (1988-03-01), Brewer
patent: 4816113 (1989-03-01), Yamazaki
patent: 4886728 (1989-12-01), Salamy et al.
patent: 4994404 (1991-02-01), Sheng et al.
patent: 5198263 (1993-03-01), Stafford et al.
patent: 5260236 (1993-11-01), Petro et al.
patent: 5433794 (1995-07-01), Fazan et al.
patent: 5508368 (1996-04-01), Knapp et al.
patent: 5656128 (1997-08-01), Hashimoto et al.
patent: 5679215 (1997-10-01), Barnes et al.
patent: 5754390 (1998-05-01), Sandhu et al.
patent: 5788778 (1998-08-01), Shang et al.
patent: 5814433 (1998-09-01), Nelson et al.
patent: 5952050 (1999-09-01), Doan
patent: 6188097 (2001-02-01), Derderian et al.
patent: 6211033 (2001-04-01), Sandhu et al.
patent: 6218237 (2001-04-01), Sandhu et al.
patent: 6238994 (2001-05-01), Derderian et al.
patent: 6297112 (2001-10-01), Lin et al.
patent: 6306702 (2001-10-01), Hao et al.
patent: 6333255 (2001-12-01), Sekiguchi
patent: 6342423 (2002-01-01), Ishida et al.
patent: 6344396 (2002-02-01), Ishida et al.
patent: 6368986 (2002-04-01), Budge et al.
patent: 6369431 (2002-04-01), Gonzalez et al.
patent: 6376284 (2002-04-01), Gonzalez et al.
patent: 6395602 (2002-05-01), Sandhu et al.
patent: 6399982 (2002-06-01), Derderian et al.
patent: 6453916 (2002-09-01), Tran et al.
patent: 6472283 (2002-10-01), Ishida et al.
patent: 6475868 (2002-11-01), Hao et al.
patent: 6495312 (2002-12-01), Young et al.
patent: 6500756 (2002-12-01), Bell et al.
patent: 6524775 (2003-02-01), Oberlander et al.
patent: 6555432 (2003-04-01), Sandhu et al.
patent: 6559017 (2003-05-01), Brown et al.
patent: 6605514 (2003-08-01), Tabery et al.
patent: 6608343 (2003-08-01), Derderian et al.
patent: 6617230 (2003-09-01), Budge et al.
patent: 6653220 (2003-11-01), Ma et al.
patent: 6653733 (2003-11-01), Gonzalez et al.
patent: 6670713 (2003-12-01), Gonzalez et al.
patent: 6700211 (2004-03-01), Gonzalez et al.
patent: 6750127 (2004-06-01), Chang et al.
patent: 6875664 (2005-04-01), Huang et al.
patent: 2001/0023123 (2001-09-01), Kim
patent: 2002/0011210 (2002-01-01), Satoh et al.
patent: 2002/0088707 (2002-07-01), Towle
patent: 2002/0132451 (2002-09-01), Akino et al.
patent: 2002/0185687 (2002-12-01), Koh et al.
patent: 2003/0001187 (2003-01-01), Basceri et al.
patent: 2003/0011011 (2003-01-01), Basceri et al.
patent: 2003/0045121 (2003-03-01), Higashi
patent: 2003/0073309 (2003-04-01), Emami
patent: 2004/0032031 (2004-02-01), Holscher et al.
patent: 2004/0043574 (2004-03-01), Steiner et al.
patent: 2004/0043626 (2004-03-01), Chou San et al.
patent: 2004/0259355 (2004-12-01), Yin et al.
patent: 2005/0042879 (2005-02-01), Yin et al.
patent: 2005/0059262 (2005-03-01), Yin et al.
patent: 2005/0255702 (2005-11-01), Honeycutt et al.
patent: 11-214290 (1999-08-01), None
U.S. Appl. No. 10/661,379 Zhiping et al. filed Sep. 12, 2003.
U.S. Appl. No. 10/661,100 Sandhu et al. filed Sep. 12, 2003.
U.S. Appl. No. 10/463,185 Yin et al. filed Jun. 17, 2003.
PCT/US2004/026517; Filed Aug. 22, 2004; International Search Report; 4 pps.
PCT/US04/026517 Written Opinion, 6 pages (Jan. 2005).

Affiliated with

Also associated with

Rating

Chemical vapor deposition apparatus and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapor deposition apparatus and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition apparatus and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2794552