Coating apparatus – Gas or vapor deposition
Patent
1997-04-09
1999-02-16
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
118724, C23C 1600
Patent
active
058715860
ABSTRACT:
Chemical vapor deposition reactions are carried out by introducing first and second precursors for the material to be deposited into a reaction chamber (5) along a plurality of separate discrete paths (21,24) where they are cooled prior to entry into the reaction chamber. The precursors are mixed in the reaction chamber which contains a heated substrate (4) and react to deposit the material on the substrate.
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Crawley John A.
Saywell Victor J.
Breneman R. Bruce
Lund Jeffrie R.
T. Swan & Co. Limited
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