Organic compounds -- part of the class 532-570 series – Organic compounds – Nitriles
Patent
1999-01-26
2000-05-16
Richter, Johann
Organic compounds -- part of the class 532-570 series
Organic compounds
Nitriles
C07C25507
Patent
active
060639539
ABSTRACT:
Disclosed are novel high-sensitivity positive- and negative-working chemical-sensitization photoresist compositions capable of giving a highly heat-resistant patterned resist layer of high resolution having excellently orthogonal cross sectional profile without being influenced by standing waves. The composition contains, as an acid generating agent by irradiation with actinic rays, a specific cyano-substituted oximesulfonate compound such as .alpha.-(methylsulfonyloxyimino)-4-methoxybenzyl cyanide. The advantages obtained by the use of this specific acid-generating agent is remarkable when the film-forming resinous ingredient has such a molecular weight distribution that the ratio of the weight-average molecular weight to the number-average molecular weight does not exceed 3.5.
REFERENCES:
patent: 4123255 (1978-10-01), Freenor, III et al.
patent: 4451286 (1984-05-01), Martin
patent: 4540598 (1985-09-01), Berner
patent: 4736055 (1988-04-01), Dietliker et al.
patent: 5019488 (1991-05-01), Mammato et al.
patent: 5529885 (1996-06-01), Ochiai et al.
patent: 5580695 (1996-12-01), Murata et al.
patent: 5627011 (1997-05-01), Munzel et al.
Hada Hideo
Komano Hiroshi
Sugeta Yoshiki
Yamazaki Hiroyuki
Richter Johann
Sackey Ebenezer
Tokyo Ohka Kogyo Co. Ltd.
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