Chemical refining method and reuse system for semiconductor devi

Details Chemical refining method and reuse system for semiconductor devi Chemical refining method and reuse system for semiconductor devi

1998-07-15

2000-10-24

Stockton, Laura L.

Organic compounds -- part of the class 532-570 series

Organic compounds

Oxygen containing

568916, C07C 2974

Patent

active

061370185

ABSTRACT:
A chemical refining and reuse method and apparatus efficiently remove water from a waste chemical used in a semiconductor device fabrication process. The method is superior to conventional refining methods, in that water is removed at the end of the refining process, followed only by particle removal, so that water is not reintroduced into the waste chemical during metallic impurity removal. Therefore, the refined waste chemical has a percentage of water therein which is equal to that of the chemical in an initial raw state. The method includes: a) removing ionic impurities contained in the waste chemical; b) removing metallic impurities contained in the waste chemical after removing the ionic impurities; c) removing water contained in the waste chemical after removing the metallic impurities; and d) removing particles contained in the waste chemical after removing the water.

REFERENCES:
patent: 5571703 (1996-11-01), Chieffalo et al.
patent: 5753125 (1998-05-01), Kreisler

Affiliated with

Also associated with

Rating

Chemical refining method and reuse system for semiconductor devi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical refining method and reuse system for semiconductor devi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical refining method and reuse system for semiconductor devi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1965636