Chemical process

Details Chemical process Chemical process

1992-03-12

1993-10-19

Siegel, Alan

Organic compounds -- part of the class 532-570 series

Organic compounds

Halogen containing

570123, C07C 1720, C07C 1700

Patent

active

052547728

ABSTRACT:
A process for the preparation of an alkane containing fluorine by contacting a halogenated alkane containing at least one hydrogen atom and at least one halogen atom selected from chlorine, bromine and iodine with a transition metal fluoride selected from osmium hexafluoride, iridium hexafluoride, rhenium hexafluoride, ruthenium pentafluoride, chromium pentafluoride, vanadium pentafluoride, rhenium heptafluoride and uranium hexafluoride, whereby to replace at least one hydrogen atom or at least one chlorine, bromine or iodine atom in said halogenated alkane starting material by a fluorine atom.
Use of certain of the defined transition metal fluorides, e.g. OsF.sub.6, IrF.sub.6 and ReF.sub.6 allows the selective replacement of halogen by fluorine, while others, e.g. UF.sub.6, VF.sub.5 and ReF.sub.7 allow selective replacement of hydrogen by fluorine.

REFERENCES:
patent: 2423045 (1943-09-01), Passino et al.
patent: 2759026 (1950-02-01), McCleary
patent: 3235608 (1962-03-01), Gibbs
patent: 3972953 (1976-08-01), Lyons

Affiliated with

Also associated with

Rating

Chemical process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1353434