Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2011-08-09
2011-08-09
Tran, Binh X (Department: 1713)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S056000, C216S057000, C216S067000, C422S198000
Reexamination Certificate
active
07993534
ABSTRACT:
A method for forming a chemical microreactor includes forming at least one capillary microchannel in a substrate having at least one inlet and at least one outlet, integrating at least one heater into the chemical microreactor, interfacing the capillary microchannel with a liquid chemical reservoir at the inlet of the capillary microchannel, and interfacing the capillary microchannel with a porous membrane near the outlet of the capillary microchannel, the porous membrane being positioned beyond the outlet of the capillary microchannel, wherein the porous membrane has at least one catalyst material imbedded therein.
REFERENCES:
patent: 5961930 (1999-10-01), Chatterjee et al.
patent: 7534402 (2009-05-01), Morse et al.
patent: 2003/0031913 (2003-02-01), Pavio et al.
Jankowski Alan
Morse Jeffrey D.
Lawrence Livermore National Security LLC
Scott Eddie E.
Tak James S.
Tran Binh X
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