Chemical mechanical polishing with multiple polishing pads

Details Chemical mechanical polishing with multiple polishing pads Chemical mechanical polishing with multiple polishing pads

1998-04-24

1999-04-27

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451 57, B24B 722

Patent

active

058974261

ABSTRACT:
In chemical mechanical polishing, a substrate is planarized with one or more fixed-abrasive polishing pads. Then the substrate is polished with a standard polishing pad to remove scratch defects created by the fixed-abrasive polishing pads.

REFERENCES:
patent: 5244534 (1993-09-01), Yu et al.
patent: 5395801 (1995-03-01), Doan et al.
patent: 5676857 (1997-10-01), Landers et al.
patent: 5718618 (1998-02-01), Guckel et al.
patent: 5823855 (1998-10-01), Robinson

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