Chemical mechanical polishing system having multiple...

Details Chemical mechanical polishing system having multiple... Chemical mechanical polishing system having multiple...

2007-08-14

2007-08-14

Eley, Timothy V. (Department: 3724)

Abrading

Abrading process

Glass or stone abrading

C451S057000, C451S059000

Reexamination Certificate

active

11329648

ABSTRACT:
A polishing method usable in an apparatus including a rotatable member rotatable about a first axis, at least one substrate head assembly supported on said rotatable member, and at least two polishing surfaces arranged below said rotatable member at respective angular positions about said first axis is described. In one implementation, a substrate can be mounted onto a first one of said at least one substrate head assembly. The rotatable member can be rotated to a position so that the substrate overlies a selected one of the polishing surfaces. The substrate can be engaged with said selected polishing surface and relative linear movement imparted between the selected polishing surface and the first substrate head assembly, while the substrate is engaged with the selected polishing surface.

REFERENCES:
patent: 1158481 (1915-11-01), Gillette
patent: 2992519 (1961-07-01), Pearson
patent: 2998680 (1961-09-01), Lipkins
patent: 3137977 (1964-06-01), Graves
patent: 3142942 (1964-08-01), Celovsky
patent: 3292312 (1966-12-01), Snyder
patent: 3377750 (1968-04-01), Day
patent: 3489608 (1970-01-01), Jacobs et al.
patent: 3505766 (1970-04-01), Boettcher et al.
patent: 3518798 (1970-07-01), Boettcher
patent: 3611654 (1971-10-01), Weber et al.
patent: 3631634 (1972-01-01), Weber
patent: 3659386 (1972-05-01), Goetz et al.
patent: 3665648 (1972-05-01), Yamanaka
patent: 3680265 (1972-08-01), McClure
patent: 3731435 (1973-05-01), Boettcher et al.
patent: 3762103 (1973-10-01), Nielson
patent: 3813825 (1974-06-01), Weber et al.
patent: 3857123 (1974-12-01), Walsh
patent: 3913271 (1975-10-01), Boettcher
patent: 3970471 (1976-07-01), Bankes et al.
patent: 4020600 (1977-05-01), Day
patent: 4021278 (1977-05-01), Hood et al.
patent: 4141180 (1979-02-01), Gill, Jr. et al.
patent: 4481738 (1984-11-01), Tabuchi
patent: 4481741 (1984-11-01), Bouladon et al.
patent: 4502252 (1985-03-01), Iwabuchi
patent: 4509298 (1985-04-01), Klievoneit
patent: 4583325 (1986-04-01), Tabuchi
patent: 4653231 (1987-03-01), Cronkhite et al.
patent: 4665781 (1987-05-01), Eichenhofer et al.
patent: 4693036 (1987-09-01), Mori
patent: 4753049 (1988-06-01), Mori
patent: 4829716 (1989-05-01), Ueda et al.
patent: 4869779 (1989-09-01), Acheson
patent: 4944119 (1990-07-01), Gill, Jr. et al.
patent: 5081051 (1992-01-01), Mattingly et al.
patent: 5081795 (1992-01-01), Tanaka et al.
patent: 5097630 (1992-03-01), Maeda et al.
patent: 5216843 (1993-06-01), Brievogel et al.
patent: 5224304 (1993-07-01), Cesna
patent: 5232875 (1993-08-01), Tuttle et al.
patent: 5246525 (1993-09-01), Sato
patent: 5317778 (1994-06-01), Kudo et al.
patent: 5329732 (1994-07-01), Karlsrud et al.
patent: 5333413 (1994-08-01), Hashimoto
patent: 5361545 (1994-11-01), Nakamura
patent: 5367545 (1994-11-01), Yamashita et al.
patent: 5404678 (1995-04-01), Hasegawa et al.
patent: 5421768 (1995-06-01), Fujiwara et al.
patent: 5443416 (1995-08-01), Volodarsky
patent: 5456627 (1995-10-01), Jackson et al.
patent: 5478435 (1995-12-01), Murphy et al.
patent: 5486131 (1996-01-01), Cesna et al.
patent: 5498199 (1996-03-01), Karlsrud et al.
patent: 5540810 (1996-07-01), Sandhu et al.
patent: 5609719 (1997-03-01), Hempel
patent: 5645466 (1997-07-01), Wikle
patent: 5649854 (1997-07-01), Gill, Jr.
patent: 5655954 (1997-08-01), Oishi et al.
patent: 5658185 (1997-08-01), Morgan, III et al.
patent: 5679059 (1997-10-01), Nishi et al.
patent: 5692947 (1997-12-01), Talieh et al.
patent: 5693036 (1997-12-01), Kilgour
patent: 5738574 (1998-04-01), Tolles et al.
patent: 5759918 (1998-06-01), Hoshizaki et al.
patent: 5779520 (1998-07-01), Hayakawa
patent: 5816891 (1998-10-01), Woo
patent: 5827110 (1998-10-01), Yajima et al.
patent: 5895270 (1999-04-01), Hempel, Jr.
patent: 5951373 (1999-09-01), Shendon et al.
patent: 6080046 (2000-06-01), Shendon et al.
patent: 6086457 (2000-07-01), Perlov et al.
patent: 6106375 (2000-08-01), Furusawa
patent: 6126517 (2000-10-01), Tolles et al.
patent: 6220941 (2001-04-01), Fishkin et al.
patent: 6241585 (2001-06-01), White
patent: 6343975 (2002-02-01), Mok
patent: 6358131 (2002-03-01), Sakurai et al.
patent: 6629883 (2003-10-01), Katsuoka et al.
patent: 6729944 (2004-05-01), Birang et al.
patent: 6793565 (2004-09-01), Chadda et al.
patent: 7097544 (2006-08-01), Tolles et al.
patent: 2001/0044266 (2001-11-01), Katsuoka et al.
patent: 2005/0048880 (2005-03-01), Tolles et al.
patent: 3411120 (1984-11-01), None
patent: 37 37 904 (1989-05-01), None
patent: 648575 (1995-04-01), None
patent: 57-132966 (1982-08-01), None
patent: 57-132969 (1982-08-01), None
patent: 59-19671 (1984-02-01), None
patent: 59-128251 (1984-02-01), None
patent: 61-76270 (1986-04-01), None
patent: 362136365 (1987-06-01), None
patent: 63-207559 (1988-08-01), None
patent: 63-256356 (1988-10-01), None
patent: 1-153266 (1989-06-01), None
patent: 7-226432 (1995-08-01), None

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