Chemical-mechanical-polishing pad cleaning process for use durin

Details Chemical-mechanical-polishing pad cleaning process for use durin Chemical-mechanical-polishing pad cleaning process for use durin

1995-01-17

1996-07-02

Kunemund, Robert

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 134 21, 216 88, 216 89, H01L 21306, H01L 21304, B08B 312, B08B 502

Patent

active

055318614

ABSTRACT:
A chemical-mechanical-polishing process in which energy is imparted to a polishing pad (18) dislodging particles (46), which are removed by vacuum withdrawal to continuously clean the surface of the polishing pad (14). Energy is imparted to polishing pad (18) by either sonic energy from acoustic waves, or by physical impaction. The acoustic waves are generated by submerging a transducer (28) in the polishing slurry (18). The transducer (28) is powered by a voltage amplifier (30) coupled to a computer controlled-frequency generator (32). The acoustic wave frequency is adjusted by the frequency generator (32) to induce sonic vibration in the polishing pad (14) such that particles (46) are continuously dislodged from polishing pad (14). Physical impaction is performed by an impaction tool (48) coupled to a vacuum head (33).

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patent: 5399234 (1995-03-01), Yu et al.

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