Compositions – Etching or brightening compositions
Reexamination Certificate
2003-09-11
2009-02-03
Goudreau, George A. (Department: 1792)
Compositions
Etching or brightening compositions
C252S079200, C252S079300
Reexamination Certificate
active
07485241
ABSTRACT:
The invention provides a chemical-mechanical polishing composition comprising: (a) fumed silica particles, (b) about 5×10−3to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, (c) about 0.1 to about 15 wt. % of an oxidizing agent, and (d) a liquid carrier comprising water. The invention also provides a polishing composition, which optionally comprises an oxidizing agent, comprising about 5×10−3to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, and mixtures thereof. The invention further provides methods for polishing a substrate using the aforementioned polishing compositions.
REFERENCES:
patent: 4064660 (1977-12-01), Lampert
patent: 5769689 (1998-06-01), Cossaboon et al.
patent: 5861055 (1999-01-01), Allman et al.
patent: 6083840 (2000-07-01), Mravic et al.
patent: 6468913 (2002-10-01), Pasqualoni et al.
patent: 6547843 (2003-04-01), Shimazu et al.
patent: 6679929 (2004-01-01), Asano et al.
patent: 6726534 (2004-04-01), Bogush et al.
patent: 6749488 (2004-06-01), Pasqualoni et al.
patent: 6841480 (2005-01-01), Simpson et al.
patent: 6844263 (2005-01-01), Shimazu et al.
patent: 2001/0003672 (2001-06-01), Inoue et al.
patent: 2001/0006224 (2001-07-01), Tsuchiya et al.
patent: 2003/0148614 (2003-08-01), Simpson et al.
patent: 2003/0234184 (2003-12-01), Liu et al.
patent: 1 193 745 (2001-02-01), None
patent: 1 229 093 (2002-01-01), None
patent: 11-080707 (1999-03-01), None
patent: 11-080708 (1999-03-01), None
patent: 555840 (2003-10-01), None
patent: WO02/04573 (2002-01-01), None
Lowenstein et al., “Competitive Adsorption of Metal Ions onto Hydrophilic Silicon Surfaces from Aqueous Solution,”Journal of the Electrochemical Society, 146(2), 719-727 (1999).
Xu et al., “Effects of Surface Ions on the Friction and Adhesion of Properties of Mica,”Langmuir, 14(8), 2187-2190 (1998).
Pach et al., “Influence of Colloidal SiO2 particles and bacteria on crystallization of CaCO3,”Biomimetics, 4(2), 63-82 (1996).
Michaud et al., “Experimental Simulation of Mechanisms Involved in the Building of Stresses in Concretes Subjected to Alkali-Silica Reaction,”Proceedings of the 10thInternational Congress on the Chemistry of Cement, Gothenburg, Sweden (Jun. 2-6, 1997).
Okamoto et al., “Surface Modification by Calcium Ions—Effect on Chromatographic Properties of Silica,”Chromatographia, 39(1-2), 29-34 (1994).
Meagher, “Direct Measurement of forces between silica surfaces in aqueous calcium chloride solutions using an atomic force microscope,”Journal of Colloid and Interface Science, 152(1), 293-295 (1992).
SciFinder Search Results, Research Topic candidates identified in CAPLUS using the phrase “The effect of calcium on CMP or chemical mechanical planarization of tantalum” (Dec. 4, 2002).
Moeggenborg Kevin J.
Schroeder David J.
Cabot Microelectronics Corporation
Goudreau George A.
Koszyk Francis J.
Lanning Robert M.
Omholt Thomas E.
LandOfFree
Chemical-mechanical polishing composition and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Chemical-mechanical polishing composition and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical-mechanical polishing composition and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4062407