Chemical mechanical polishing apparatus having conditioning...

Details Chemical mechanical polishing apparatus having conditioning... Chemical mechanical polishing apparatus having conditioning...

2006-04-11

2006-04-11

Rose, Robert A. (Department: 3723)

Abrading

Machine

Rotary tool

C451S444000, C451S056000

Reexamination Certificate

active

07025663

ABSTRACT:
A chemical mechanical polishing apparatus having a conditioning cleaning device capable of efficiently cleaning a diamond pad is disclosed. The conditioner cleaning device of the present invention is capable of increasing cleaning efficiency by uniformly spraying a cleaning solution on upper and side faces of a diamond disk. When the diamond disk is efficiently cleaned, the process reliability of a wafer is increased.

REFERENCES:
patent: 4433639 (1984-02-01), Brown
patent: 6126530 (2000-10-01), Hirata
patent: 6319105 (2001-11-01), Togawa et al.
patent: 6358124 (2002-03-01), Koga et al.

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